Pembentukan Titanium Nitrida (TiN) dengan Proses Nitriding pada Titanium Murni Menggunakan Plasma Densitas Tinggi
Keywords:Titanium Murni, Sistem Plasma RF-DC, Nitriding Temperatur Rendah, Kekerasan Permukaan, Titanium Nitride
Pure titanium has been widely utilized in industry but its products suffered from low wear and erosion resistance. The plasma nitriding was selected as a tool to harden the pure titanium products but typically high temperature processing was required to attain high hardness. In the present study, high density plasma nitriding system was applied to make low temperature plasma nitriding at 723 K (or 450Â°C) for 14.4 ks (or 4 hours).Â The average measured hardness reached to 624 HV.Â This high hardness of plasma-nitrided pure titanium at low temperature was attributed to formation of fine TiN precipitates and nitrogen solid solution into vacancy sites in the HCP crystalline structure of titanium.
Buijs, K. and V.L. Stainless, V.L., 2008, Characteristic and uses of titanium, Stainless World, pp. 1-4.
1-  Zhecheva, A., Wei Sha, Malinov, S. and Long, A., 2005, Enhancing the microstructure and properties of titanium alloys through nitriding and other surface engineering methods, J. of Surface & Coating Technology 200, pp. 2192-2207.
Koyuncu, E., Kahraman, F. and Karadeniz, O., 2009, Investigation of surface properties of high temperature nitrided titanium alloys. J. of Achievements in Material and Manufacturing Engineering, vol. 37 (2), pp. 434-441.
Yoshida, M., Ichiki, R. and Utsumi, N., 2013, Surface hardening of titanium using gas nitriding, J. of Precision Engineering and Manufacturing, vol. 14, no. 6, pp. 971-976.
Yilmazer, H., Yilmaz, S. and Acma, E., 2009, Treatment of surface properties of titanium with plasma (ion) nitriding, Article in Defect and Diffusion Forum, vol. 283-286, pp. 401-405.
Tong, W.P., Han, Z., Wang, L.M., Lu, J. and Lu, K., 2008, Low-temperature nitriding of 38CrMoAl steel with a nanostructured surface layer induced by surface mechanical attrition treatment, J. of Surface & Coating Technology 202, pp. 4957-4963.
Aizawa, T. and Sugita, Y., 2011, Development of RF-DC plasma system for nitriding of aluminium alloys, In ICMCTF-2011, Vol. 1, pp. 47-48.
Brading, H.J., Morton, P.H., Bell, T., and Earwaker, L.G., 1992. Plasma Nitriding with Nitrogen, Hydrogen, and Argon Gas Mixtures: Structure and Composition of Coatings on Titanium, Surface Engineering, vol. 8 (3), pp. 206-212.
Errandonea, D., Meng, Y., Somayazulu, M. and HÃ¤usermann, D., 2005, Pressure-induced ï¡ ï‚® ï· transition in titanium metal: A systematic study of the effect of uniaxial stress, Physica B, vol. 355, pp 116.
Gicouel, A., Laidani, N., Saillard, P. and Amouroux, J., 1990, Plasma and nitrides: application to the nitriding of titanium, J. Pure & Applied Chem., vol. 62, no. 9, pp. 1743-1750.
Hennig, R.G., Trinkle, D.R., Bouchet, J., Srinivasan, S.G., Albers, R.C., and J.W. Wilkins, J.W., 2005, Impurities block the ï¡ to ï· martensitic transformation in titanium, Nature Materials, vol. 4, pp. 129-133.
This work is licensed under aÂ Creative Commons Attribution-NonCommercial 4.0 International License.