Pembentukan Titanium Nitrida (TiN) dengan Proses Nitriding pada Titanium Murni Menggunakan Plasma Densitas Tinggi


  • Josephine Maria Windajanti 1. Jurusan Fisika, FMIPA, Universitas Brawijaya 2. SMAK Santa Maria Malang
  • Dionysius Joseph Djoko Herry Santjojo Jurusan Fisika, Universitas Brawijaya
  • Abdurrouf Abdurrouf Jurusan Fisika, Universitas Brawijaya



Titanium Murni, Sistem Plasma RF-DC, Nitriding Temperatur Rendah, Kekerasan Permukaan, Titanium Nitride


Pure titanium has been widely utilized in industry but its products suffered from low wear and erosion resistance. The plasma nitriding was selected as a tool to harden the pure titanium products but typically high temperature processing was required to attain high hardness. In the present study, high density plasma nitriding system was applied to make low temperature plasma nitriding at 723 K (or 450°C) for 14.4 ks (or 4 hours).  The average measured hardness reached to 624 HV.  This high hardness of plasma-nitrided pure titanium at low temperature was attributed to formation of fine TiN precipitates and nitrogen solid solution into vacancy sites in the HCP crystalline structure of titanium.


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